Exclusive

Publication

Byline

Location

INTERNATIONAL PATENT: TOHOKU UNIVERSITY, 国立大学法人東北大学 FILES APPLICATION FOR "ANTIGEN DETECTION METHOD AND ANTIGEN DETECTION DEVICE"

GENEVA, Oct. 27 -- TOHOKU UNIVERSITY (2-1-1, Katahira, Aoba-ku, Sendai-shi, Miyagi9808577), 国立大学法人東北大学 (宮城県&#... Read More


INTERNATIONAL PATENT: UTILIZATION OF CARBON DIOXIDE INSTITUTE CO., LTD., 株式会社CO2資源化研究所 FILES APPLICATION FOR "BIOTIN-AUXOTROPHIC HYDROGEN-OXIDIZING BACTERIUM MUTANT"

GENEVA, Oct. 27 -- UTILIZATION OF CARBON DIOXIDE INSTITUTE CO., LTD. (14F Tradepia Odaiba Bldg., 2-3-1 Daiba, Minato-ku, Tokyo1350091), 株式会社CO2資... Read More


INTERNATIONAL PATENT: TOSOH CORPORATION, 東ソー株式会社 FILES APPLICATION FOR "SINTERED BODY OF GALLIUM NITRIDE"

GENEVA, Oct. 27 -- TOSOH CORPORATION (4560, Kaisei-cho, Shunan-shi, Yamaguchi7468501), 東ソー株式会社 (山口県周南市&#38283... Read More


INTERNATIONAL PATENT: TOYODA GOSEI CO., LTD., 豊田合成株式会社 FILES APPLICATION FOR "VEHICLE BEAM AND FRONT STRUCTURE OF VEHICLE"

GENEVA, Oct. 27 -- TOYODA GOSEI CO., LTD. (1, Haruhinagahata, Kiyosu-shi, Aichi4528564), 豊田合成株式会社 (愛知県清須&#240... Read More


INTERNATIONAL PATENT: NTT DOCOMO, INC., 株式会社NTTドコモ FILES APPLICATION FOR "TERMINAL, WIRELESS COMMUNICATION METHOD AND BASE STATION"

GENEVA, Oct. 27 -- NTT DOCOMO, INC. (11-1,Nagatacho 2-chome, Chiyoda-ku, Tokyo1006150), 株式会社NTTドコモ (東京都&#2131... Read More


INTERNATIONAL PATENT: NIPPON A&L INC., 日本エイアンドエル株式会社 FILES APPLICATION FOR "GRAFT COPOLYMER AND THERMOPLASTIC RESIN COMPOSITION"

GENEVA, Oct. 27 -- NIPPON A&L INC. (5-33, Kitahama 4-chome, Chuo-ku, Osaka-shi, Osaka5418550), 日本エイアンドエル株式会社 ... Read More


INTERNATIONAL PATENT: JFE STEEL CORPORATION, JFEスチール株式会社, PRIOR, INC., 株式会社プライア FILES APPLICATION FOR "PARTIAL-DISCHARGE ANALYSIS SYSTEM"

GENEVA, Oct. 27 -- JFE STEEL CORPORATION (2-3, Uchisaiwai-cho 2-chome, Chiyoda-ku, Tokyo1000011), JFEスチール株式会社 (東&#20... Read More


INTERNATIONAL PATENT: IGARASHI HIROYUKI, 五十嵐 啓晋 FILES APPLICATION FOR "FINGER STRENGTH EXERCISE DEVICE"

GENEVA, Oct. 27 -- IGARASHI Hiroyuki (9-11, Nishigaoka 1-chome, Kita-ku, Tokyo1150056), 五十嵐 啓晋 (東京都北区西が&#1999... Read More


INTERNATIONAL PATENT: SHIN-ETSU HANDOTAI CO., LTD., 信越半導体株式会社 FILES APPLICATION FOR "EPITAXIAL SUBSTRATE, METHOD FOR MANUFACTURING SAME AND METHOD FOR MANUFACTURING VERTICAL DEVICE SUBSTRATE"

GENEVA, Oct. 27 -- SHIN-ETSU HANDOTAI CO., LTD. (2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo1000004), 信越半導体株式会社 (東京都&#... Read More


INTERNATIONAL PATENT: TOKYO OHKA KOGYO CO., LTD., 東京応化工業株式会社 FILES APPLICATION FOR "TREATMENT LIQUID, METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE"

GENEVA, Oct. 27 -- TOKYO OHKA KOGYO CO., LTD. (150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa2110012), 東京応化工業株式会社 (神&... Read More